E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions
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DOI: 10.1063/5.0146168
Abstract: Electronegative inductively coupled plasmas (ICPs) are used for conductor etching in the microelectronics industry for semiconductor fabrication. Pulsing of the antenna power and bias voltages provides additional control for optimizing plasma–surface interactions. However, pulsed ICPs… read more here.
Keywords: coupled plasmas; antenna; antenna geometry; geometry ... See more keywords