Conformal Deposition of Conductive Single-Crystalline Cobalt Silicide Layer on Si Wafer via a Molecular Approach
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DOI: 10.1021/acs.chemmater.8b00701
Abstract: The realization of metal–semiconductor contacts plays a significant role in ultrascaled integrated circuits. Here, we establish a low-temperature molecular approach for the conformal deposition of a 20 nm Co-rich layer on Si (100) wafers by… read more here.
Keywords: conformal deposition; molecular approach; layer; approach conformal ... See more keywords