Area-selective electrodeposition of micro islands for CuInSe2-based photovoltaics
Sign Up to like & getrecommendations! Published in 2019 at "Results in Physics"
DOI: 10.1016/j.rinp.2019.02.047
Abstract: Abstract For mass fabrication of highly-efficient photovoltaic modules based on Cu(In,Ga)Se2 (CIGSe) absorber layers the availability and cost of the critical raw materials In and Ga present a potential bottleneck. The micro-concentrator solar cell concept… read more here.
Keywords: selective electrodeposition; micro islands; electrodeposition; micro ... See more keywords
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Sign Up to like & getrecommendations! Published in 2023 at "Langmuir"
DOI: 10.1021/acs.langmuir.2c03214
Abstract: Area-selective atomic layer deposition using small-molecule inhibitors (SMIs) involves vapor-phase dosing of inhibitor molecules, resulting in an industry-compatible approach. However, the identification of suitable SMIs that yield a high selectivity remains a challenging task. Recently,… read more here.
Keywords: area selective; adsorption; growth; area ... See more keywords
Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
Sign Up to like & getrecommendations! Published in 2023 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.3c03752
Abstract: Area-selective atomic layer deposition (AS-ALD) has drawn significant attention in the past decade because of the potential applications in bottom-up processing, which enables fabricating nanostructures at the atomic level without multiple patterning and lithographic processing… read more here.
Keywords: area selective; layer deposition; atomic layer; deposition ... See more keywords
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns.
Sign Up to like & getrecommendations! Published in 2017 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.7b13365
Abstract: The reaction mechanism of area-selective atomic layer deposition (AS-ALD) of Al2O3 thin films using self-assembled monolayers (SAMs) was systematically investigated by theoretical and experimental studies. Trimethylaluminum (TMA) and H2O were used as the precursor and… read more here.
Keywords: al2o3; area selective; deposition; selective atomic ... See more keywords
Area-selective Photodeformation Behavior of N-benzylideneaniline Liquid Crystalline Polymeric Films Prepared with Sublimed Crosslinker
Sign Up to like & getrecommendations! Published in 2018 at "Molecular Crystals and Liquid Crystals"
DOI: 10.1080/15421406.2019.1595474
Abstract: Abstract Photomobile materials exhibit deformed macroscopic shape in response to actinic lighting. We report the photoinduced macroscopic deformation behavior of a crosslinked liquid crystalline N-benzylideneaniline (NBA) film. The film is observed to bend toward the… read more here.
Keywords: benzylideneaniline; area selective; liquid crystalline; film ... See more keywords
Correcting defects in area selective molecular layer deposition
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4980049
Abstract: Area selective deposition, as used with atomic layer deposition and molecular layer deposition (MLD), is a rapidly emerging field of study due to its potential applications in micro- and nanoelectronic devices. Previous studies have shown… read more here.
Keywords: layer; area selective; deposition; molecular layer ... See more keywords
Area-selective aerosol jet fog deposition: Advancing large-area and sustainable fabrication
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/6.0000642
Abstract: In this work, we demonstrate controlled area-selective deposition of aluminum oxide phosphate (AlPO) at room temperature and near atmospheric pressure using a potentially zero-waste aerosol jet fog (ajFOG) deposition system. Octyl-trichlorosilane (OTS-8) self-assembled monolayers (SAMs)… read more here.
Keywords: area selective; area; deposition; aerosol jet ... See more keywords
Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/6.0000701
Abstract: The increasingly complex nanoscale three-dimensional and multilayered structures utilized in nanoelectronic, catalytic, and energy conversion/storage devices necessitate novel substrate-selective material deposition approaches featuring bottom-up and self-aligned precision processing. Here, we demonstrate the area-selective atomic layer… read more here.
Keywords: layer; area selective; deposition; selective atomic ... See more keywords
Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Materials Research"
DOI: 10.1557/s43578-020-00013-4
Abstract: An area-selective atomic layer deposition (AS-ALD) process is developed that achieves increased selectivity by combining two strategies: i) selective enhancement using a small molecule activator and ii) self-assembled monolayer (SAM)-based inhibition. Specifically, we show that… read more here.
Keywords: increased selectivity; based inhibition; selectivity; inhibition ... See more keywords