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Published in 2020 at "Environmental science & technology"
DOI: 10.1021/acs.est.0c02781
Abstract: Cerium oxide (CeO2) nanoparticles (NPs) are massively used as abrasives in the chemical mechanical polishing (CMP), an essential process to manufacture semiconductor wafers. The CMP process for arsenide-based semiconductor materials produces a wastewater with co-occurring…
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Keywords:
adsorption;
cerium oxide;
ceo2 nps;
arsenic ions ... See more keywords
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Published in 2017 at "Molecular Simulation"
DOI: 10.1080/08927022.2017.1321754
Abstract: The presence of high concentration of arsenic in conventional water sources can cause serious health and environmental hazards. An urgent need is to find an efficient adsorbent for the removal of arsenic ions (As) from…
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Keywords:
adsorption;
removal arsenic;
molecular dynamics;
nanosheet ... See more keywords
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Published in 2019 at "DESALINATION AND WATER TREATMENT"
DOI: 10.5004/dwt.2019.24445
Abstract: Heavy metals are considered as the hazardous pollutants of water sources around the world. The objective of this study is to investigate the kinetics, thermodynamics, and the isotherms of arsenic heavy metal ion removal process…
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Keywords:
adsorption;
chlorella vulgaris;
arsenic ions;
using chlorella ... See more keywords