Residual stress release for SU-8 structures by water assist ultrasonic
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DOI: 10.1007/s00542-018-3767-8
Abstract: High aspect ratio capability leads to a successful use of SU-8 photo-resist in a diversity of micro-scale polymer devices as a construction material. However, SU-8 structures fabricated by conventional photolithography technique suffer from high residual… read more here.
Keywords: stress release; water assist; residual stress; stress ... See more keywords