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Published in 2017 at "Journal of Alloys and Compounds"
DOI: 10.1016/j.jallcom.2017.03.044
Abstract: Mg-Ti-H films with a Ti content in the range 0 at.% Ti < 20 were obtained in a single-step process using the microwave reactive plasma-assisted co-sputtering technique. The morphology, crystal structure, chemical composition and spatial…
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Keywords:
plasma assisted;
morphology microstructure;
assisted sputtering;
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Published in 2018 at "Semiconductors"
DOI: 10.1134/s1063782618030028
Abstract: Copper (I) oxide and zinc oxide films are formed on silicon and glassy quartz substrates by magnetron assisted sputtering. The thickness of the films is tens and hundreds of nanometers. The films are grown at…
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Keywords:
formation cu2o;
crystal layers;
cu2o zno;
assisted sputtering ... See more keywords
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Published in 2022 at "Applied optics"
DOI: 10.1364/oic.2022.wb.2
Abstract: This work presents the characterization of the optical and mechanical properties of thin films based on (T a 2 O 5)1-x (S i O 2)x mixed oxides deposited by microwave plasma assisted co-sputtering, including post-annealing…
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Keywords:
coatings gravitational;
microwave plasma;
assisted sputtering;
plasma assisted ... See more keywords