Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory.
Sign Up to like & getrecommendations! Published in 2022 at "Applied optics"
DOI: 10.1364/ao.467761
Abstract: In this paper, a method is proposed to solve the initial optical structure of an off-axis multimirror system for an extreme ultraviolet lithography (EUVL) application. By tracing the characteristic rays, the primary aberration can be… read more here.
Keywords: system; aberration; extreme ultraviolet; seidel aberration ... See more keywords