Focused ion beam implantation for the nucleation of self-catalyzed III-V nanowires
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DOI: 10.1016/j.mee.2017.03.003
Abstract: Abstract Focused ion beam implantation was used for the formation of Ga droplets which act as nucleation points for self-catalyzed, molecular beam epitaxy-grown nanowires on Si(111). In order to further optimize the growth, the substrate… read more here.
Keywords: beam implantation; ion beam; focused ion; implantation ... See more keywords