Tailored Optical Functionality by Combining Electron‐Beam and Focused Gold‐Ion Beam Lithography for Solid and Inverse Coupled Plasmonic Nanostructures
Sign Up to like & getrecommendations! Published in 2020 at "Advanced Optical Materials"
DOI: 10.1002/adom.202000879
Abstract: DOI: 10.1002/adom.202000879 plasmonic structures, they struggle as soon as complex arrangements of different nanoparticles are needed, possibly even distributed on large areas as well as in periodic arrangements. Only recently, with the advent of sophisticated… read more here.
Keywords: ion beam; beam lithography; lithography; electron beam ... See more keywords
Utilization of As50Se50 thin films in electron beam lithography
Sign Up to like & getrecommendations! Published in 2021 at "Materials Chemistry and Physics"
DOI: 10.1016/j.matchemphys.2020.124052
Abstract: Abstract Chalcogenide glass of As50Se50 composition have been intensively studied for its interesting physical and chemical properties. Presented manuscript explores the applicability of As50Se50 thermally evaporated thin films in electron beam lithography exploiting wet etching… read more here.
Keywords: thin films; beam lithography; films electron; electron beam ... See more keywords
Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning
Sign Up to like & getrecommendations! Published in 2020 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2020.111272
Abstract: Abstract Grayscale electron beam lithography (g-EBL) is a fabrication technique that allows for tunable control of resist topography. In most cases, the height of the structures is in the submicron regime. Here, we present an… read more here.
Keywords: well controlled; beam lithography; grayscale; development ... See more keywords
A study of greyscale electron beam lithography for a 3D round shape Kinoform lens for hard X-ray optics
Sign Up to like & getrecommendations! Published in 2020 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2020.111435
Abstract: Abstract For high quality imaging of materials in nanoscale by hard X-ray optics, high resolution lenses with high focusing/imaging efficiency are needed. Refraction based conventional Kinoform lenses with 1D linear configuration in Si has been… read more here.
Keywords: beam lithography; hard ray; optics; kinoform ... See more keywords
Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography
Sign Up to like & getrecommendations! Published in 2022 at "ACS Applied Energy Materials"
DOI: 10.1021/acsaem.1c03091
Abstract: Lead-halide perovskite (LHP) nanocrystals have proven themselves as an interesting material platform due to their easy synthesis and compositional versatility, allowing for a tunable band gap, strong absorption, and high photoluminescence quantum yield (PLQY). This… read more here.
Keywords: electron beam; beam lithography; lhp nanocrystals;
Functional Changes during Electron-Beam Lithography of Biotinylated Poly(ethylene glycol) Thin Films
Sign Up to like & getrecommendations! Published in 2019 at "ACS Macro Letters"
DOI: 10.1021/acsmacrolett.9b00585
Abstract: In contrast to photolithography where particular wavelengths of light can couple to specific photochemistries, electron-beam lithography can drive competing chemistries. To separate surface-grafting, cross-linking, and chemical functionality, we studied the effects of 2 keV electrons… read more here.
Keywords: thin films; beam lithography; poly ethylene; ethylene glycol ... See more keywords
All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials.
Sign Up to like & getrecommendations! Published in 2023 at "ACS nano"
DOI: 10.1021/acsnano.2c12387
Abstract: Electron beam lithography uses an accelerated electron beam to fabricate patterning on an electron-beam-sensitive resist but requires complex dry etching or lift-off processes to transfer the pattern to the substrate or film on the substrate.… read more here.
Keywords: electron beam; beam lithography; chip; electron ... See more keywords
Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
Sign Up to like & getrecommendations! Published in 2024 at "Nature Communications"
DOI: 10.1038/s41467-024-47293-6
Abstract: Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust… read more here.
Keywords: electron beam; chemistry; beam; photo electron ... See more keywords
Nanoantennas and metasurfaces tailored by electron beam lithography and substrate conductivity
Sign Up to like & getrecommendations! Published in 2025 at "Scientific Reports"
DOI: 10.1038/s41598-025-12996-3
Abstract: The precision and reproducibility in the fabrication of periodic nanoantenna arrays are crucial for metasurfaces to achieve consistent and controllable optical responses, and electron beam lithography (EBL) enables this by providing patterning with high resolution… read more here.
Keywords: electron beam; beam lithography; substrate conductivity; conductivity ... See more keywords
Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures.
Sign Up to like & getrecommendations! Published in 2020 at "Nanoscale"
DOI: 10.1039/d0nr01032d
Abstract: Electron-beam lithography is widely applied in nanofabrication due to its high resolution. However, it suffers from low throughput due to its patterning process. All the pixels within a pattern's boundary are needed to be scanned… read more here.
Keywords: polygon; beam lithography; lithography; electron beam ... See more keywords
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning.
Sign Up to like & getrecommendations! Published in 2024 at "Nanoscale"
DOI: 10.1039/d3nr04819e
Abstract: The reduction of the critical dimension (CD) usually improves the resolution of patterns and performance of chips. In chip manufacturing, electron beam lithography (EBL) is a promising technology for preparing sub-10 nm patterns, and its… read more here.
Keywords: formulation; electron beam; photoresist formulation; resolution ... See more keywords