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Published in 2020 at "Advanced Optical Materials"
DOI: 10.1002/adom.202000879
Abstract: DOI: 10.1002/adom.202000879 plasmonic structures, they struggle as soon as complex arrangements of different nanoparticles are needed, possibly even distributed on large areas as well as in periodic arrangements. Only recently, with the advent of sophisticated…
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Keywords:
ion beam;
beam lithography;
lithography;
electron beam ... See more keywords
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Published in 2021 at "Materials Chemistry and Physics"
DOI: 10.1016/j.matchemphys.2020.124052
Abstract: Abstract Chalcogenide glass of As50Se50 composition have been intensively studied for its interesting physical and chemical properties. Presented manuscript explores the applicability of As50Se50 thermally evaporated thin films in electron beam lithography exploiting wet etching…
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Keywords:
thin films;
beam lithography;
films electron;
electron beam ... See more keywords
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Published in 2020 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2020.111272
Abstract: Abstract Grayscale electron beam lithography (g-EBL) is a fabrication technique that allows for tunable control of resist topography. In most cases, the height of the structures is in the submicron regime. Here, we present an…
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Keywords:
well controlled;
beam lithography;
grayscale;
development ... See more keywords
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Published in 2020 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2020.111435
Abstract: Abstract For high quality imaging of materials in nanoscale by hard X-ray optics, high resolution lenses with high focusing/imaging efficiency are needed. Refraction based conventional Kinoform lenses with 1D linear configuration in Si has been…
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Keywords:
beam lithography;
hard ray;
optics;
kinoform ... See more keywords
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Published in 2022 at "ACS Applied Energy Materials"
DOI: 10.1021/acsaem.1c03091
Abstract: Lead-halide perovskite (LHP) nanocrystals have proven themselves as an interesting material platform due to their easy synthesis and compositional versatility, allowing for a tunable band gap, strong absorption, and high photoluminescence quantum yield (PLQY). This…
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Keywords:
electron beam;
beam lithography;
lhp nanocrystals;
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Published in 2019 at "ACS Macro Letters"
DOI: 10.1021/acsmacrolett.9b00585
Abstract: In contrast to photolithography where particular wavelengths of light can couple to specific photochemistries, electron-beam lithography can drive competing chemistries. To separate surface-grafting, cross-linking, and chemical functionality, we studied the effects of 2 keV electrons…
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Keywords:
thin films;
beam lithography;
poly ethylene;
ethylene glycol ... See more keywords
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Published in 2023 at "ACS nano"
DOI: 10.1021/acsnano.2c12387
Abstract: Electron beam lithography uses an accelerated electron beam to fabricate patterning on an electron-beam-sensitive resist but requires complex dry etching or lift-off processes to transfer the pattern to the substrate or film on the substrate.…
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Keywords:
electron beam;
beam lithography;
chip;
electron ... See more keywords
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Published in 2020 at "Nanoscale"
DOI: 10.1039/d0nr01032d
Abstract: Electron-beam lithography is widely applied in nanofabrication due to its high resolution. However, it suffers from low throughput due to its patterning process. All the pixels within a pattern's boundary are needed to be scanned…
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Keywords:
polygon;
beam lithography;
lithography;
electron beam ... See more keywords
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Published in 2023 at "Integrated Ferroelectrics"
DOI: 10.1080/10584587.2023.2191554
Abstract: Abstract In order to obtain the high performance output of DBR semiconductor laser, the grating pattern is photolithographed by electron beam exposure technique, and the grating structure is fabricated by combining inductively coupled plasma etching…
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Keywords:
semiconductor lasers;
dbr semiconductor;
semiconductor;
electron beam ... See more keywords
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Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac780d
Abstract: We present the fabrication of three-dimensional inlets with gradually decreasing widths and depths and with nanopillars on the slope, all defined in just one lithography step. In addition, as an application, we show how these…
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Keywords:
lithography;
dose modulated;
beam;
analysis ... See more keywords
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Published in 2020 at "Journal of Microelectromechanical Systems"
DOI: 10.1109/jmems.2020.2967174
Abstract: Flat surfaces decorated with micro- and nanostructures are important tools in biomedical research used to control cellular shape, in studies of mechanotransduction, membrane mechanics, cell migration and cellular interactions with nanostructured surfaces. Existing methods to…
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Keywords:
beam lithography;
electron beam;
fabrication;
research ... See more keywords