Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources
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DOI: 10.1021/acs.jpcc.7b05240
Abstract: Growth characteristics and properties of BeO films grown by atomic layer deposition (ALD) are investigated. ALD chemistries between dimethylberyllium and two different oxygen sources, H2O and O3, are governed by different reaction mechanisms, resulting in… read more here.
Keywords: grown atomic; atomic layer; beo films; films grown ... See more keywords