Effects of bias pulse frequencies on reactively sputter deposited NbOx films
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DOI: 10.1016/j.tsf.2018.06.040
Abstract: Abstract Within the current work, niobium oxide thin films have been deposited by reactive d.c. magnetron sputtering from cold gas sprayed niobium targets, applying a systematic variation of oxygen partial pressure, bias pulse frequency and… read more here.
Keywords: oxygen partial; bias pulse; films effects; partial pressure ... See more keywords