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Published in 2024 at "Advanced Functional Materials"
DOI: 10.1002/adfm.202401170
Abstract: A low‐thermal‐budget fabrication approach is developed to realize high‐performance fluorine‐doped indium oxide (In2O3:F) thin‐film transistors (TFTs) with remarkable bias‐stress stability. The ultrathin transistor channel layer is prepared by a re‐developed atomic layer deposition (ALD) process…
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Keywords:
layer;
bias stress;
stress stability;
remarkable bias ... See more keywords
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Published in 2022 at "Advanced Materials"
DOI: 10.1002/adma.202205377
Abstract: Conjugated polymer field‐effect transistors are emerging as an enabling technology for flexible electronics due to their excellent mechanical properties combined with sufficiently high charge‐carrier mobilities and compatibility with large‐area, low‐temperature processing. However, their electrical stability…
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Keywords:
stability;
bias stress;
state;
conjugated polymer ... See more keywords
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Published in 2017 at "Solid-state Electronics"
DOI: 10.1016/j.sse.2017.10.022
Abstract: Abstract We propose a universal model for bias-stress (BS)-induced instability in the inkjet-printed carbon nanotube (CNT) networks used in field-effect transistors (FETs). By combining two experimental methods, i.e., a comparison between air and vacuum BS…
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Keywords:
universal model;
model bias;
bias stress;
stress induced ... See more keywords
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Published in 2020 at "Solid-state Electronics"
DOI: 10.1016/j.sse.2020.107841
Abstract: Abstract In this work, the electrical stability of zinc nitride (Zn3N2) Thin-film Transistors (TFTs) under negative bias stress (NBS) and positive bias stress (PBS) is presented. The Zn3N2 TFTs were fabricated on plastic substrates. Spin-on…
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Keywords:
zinc nitride;
thin film;
bias stress;
stress ... See more keywords
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Published in 2020 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.0c17317
Abstract: Because of the excellent electrical properties, III-V semiconductor nanowires are promising building blocks for next-generation electronics; however, their rich surface states inevitably contribute large amounts of charge traps, leading to gate bias stress instability and…
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Keywords:
stress instability;
gate bias;
hysteresis;
bias stress ... See more keywords
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Published in 2024 at "AIP Advances"
DOI: 10.1063/5.0232559
Abstract: Indium–gallium–zinc oxide (IGZO) as a star material has been broadly applied in multiple functional devices, including planar displays, flexible electronic devices, and photoelectronics. In recent years, the development of artificial intelligence and great data also…
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Keywords:
bias stress;
dual gate;
igzo;
igzo tft ... See more keywords
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Published in 2024 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ad1b15
Abstract: Amorphous InGaZnO (a-IGZO) has attracted a lot of attention as a high-mobility channel material for thin film transistors (TFTs). However, the instability mechanism involving threshold voltage and subthreshold swing (SS) in a-IGZO TFTs still requires…
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Keywords:
threshold voltage;
bias stress;
amorphous ingazno;
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Published in 2024 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2024.3368143
Abstract: Bias-stress effect causing undesirable charge trapping and performance degradation are considered huge obstacles for high-performance organic transistors. Besides the extra effort to suppress it, it is innovative to use the synergy of bias-stress effect and…
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Keywords:
stress effect;
bias stress;
bias;
photoexcitation ... See more keywords
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Published in 2023 at "Micromachines"
DOI: 10.3390/mi14040842
Abstract: In this work, an electrical stability model based on surface potential is presented for amorphous In-Ga-Zn-O (a-IGZO) thin film transistors (TFTs) under positive-gate-bias stress (PBS) and light stress. In this model, the sub-gap density of…
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Keywords:
stress;
tfts positive;
surface potential;
bias stress ... See more keywords