Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
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DOI: 10.1016/j.ceramint.2020.01.001
Abstract: Abstract The continuous device scaling of dynamic random access memories has been increasing demands for the development of dielectric materials with high dielectric constants and low leakage currents. In this study, we developed MgO thin… read more here.
Keywords: thin films; using bis; atomic layer; bis ethylcyclopentadienyl ... See more keywords