Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching
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DOI: 10.3390/nano12193269
Abstract: Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such… read more here.
Keywords: bombardment enhanced; ion bombardment; nanofabrication; silicon ... See more keywords