Growth temperature impact on film quality of hBN grown on Al2O3 using non-catalyzed borazane CVD
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Materials Science: Materials in Electronics"
DOI: 10.1007/s10854-017-7294-7
Abstract: Hexagonal boron nitride (hBN) films were directly grown on c-plane Al2O3 substrates by low pressure thermal chemical vapor deposition (CVD) with single precursor i.e. borazane (NH3-BH3) without employing any extra catalysis. The growth temperature influence… read more here.
Keywords: growth temperature; film; cvd; borazane ... See more keywords