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Published in 2018 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2018.07.004
Abstract: Abstract Alumina films (~2 μm thick) were deposited with a mixed Cu/Al interlayer onto copper. Direct current (DC)/Pulsed DC (PDC) magnetron sputtering techniques were independently compared for reactive alumina sputtering. In DC sputtered films, elemental aluminium…
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Keywords:
magnetron sputtering;
alumina;
breakdown alumina;
dielectric breakdown ... See more keywords