Laser induced dielectric breakdown for synthesis of chlorofluorosilanes
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DOI: 10.1016/j.jfluchem.2020.109692
Abstract: Abstract Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different… read more here.
Keywords: temperature; laser induced; induced dielectric; dielectric breakdown ... See more keywords