Utilizing tertiary butyl iodide as an effective film quality enhancing agent for atomic layer deposition of HfO2 dielectric thin films
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DOI: 10.1063/5.0055847
Abstract: The effects of the initial pulse of tert-butyl iodide as a surfactant in atomic layer deposition of HfO2 using cyclopentadienyl tris(dimethylamino) hafnium, CpHf(NMe2)3, and ozone, O3, are investigated at 320, 300, and 250 °C. The formation… read more here.
Keywords: butyl iodide; film quality; film; hfo2 ... See more keywords