Photochemical synthesis of the Fe 0 /C 3 N 4 /MoS 2 heterostructure as a highly active and reusable photocatalyst
Sign Up to like & getrecommendations! Published in 2017 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2017.06.050
Abstract: Abstract The Fe0/C3N4/MoS2 heterostructure was fabricated through photochemical synthesis that was free of NaBH4. Specifically, the g-C3N4/MoS2 (GCNM) composite was used as the substrate. Visible light excited the electrons from the valence band of the… read more here.
Keywords: photochemical synthesis; c3n4 mos2; synthesis mos; heterostructure ... See more keywords
Photocatalytic degradation of bisphenol-A with g-C3N4/MoS2-PANI nanocomposite: Kinetics, main active species, intermediates and pathways
Sign Up to like & getrecommendations! Published in 2020 at "Journal of Molecular Liquids"
DOI: 10.1016/j.molliq.2020.113339
Abstract: Abstract The novel highly porous photocatalyst g-C3N4/MoS2-PANI (polyaniline) is fabricated successfully via an in-situ polymerization and is characterized via UV–vis DRS, FTIR, TGA, SEM, XRD, TEM, XPS and BET. The synergistic effect of MoS2 and… read more here.
Keywords: degradation; c3n4 mos2; mos2 pani; c3n4 ... See more keywords
Interfacial Chemical Bond Engineering in a Direct Z-Scheme g-C3N4/MoS2 Heterojunction.
Sign Up to like & getrecommendations! Published in 2023 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c21046
Abstract: The Z-scheme heterojunction shows great potential in photocatalysis due to its superior carrier separation efficiency and strong photoredox properties. However, how to regulate the charge separation at the nanometric interface of heterostructures still remains a… read more here.
Keywords: chemical bond; interfacial chemical; scheme; c3n4 mos2 ... See more keywords
Electron-assisted synthesis of g-C3N4/MoS2 composite with dual defects for enhanced visible-light-driven photocatalysis
Sign Up to like & getrecommendations! Published in 2021 at "RSC Advances"
DOI: 10.1039/d0ra10148f
Abstract: g-C3N4/MoS2 composites were successfully prepared by an electron-assisted strategy in one step. Dielectric barrier discharge (DBD) plasma as an electron source, which has low bulk temperature and high electron energy, can etch and modify the… read more here.
Keywords: electron assisted; c3n4; dual defects; c3n4 mos2 ... See more keywords