Cryo atomic layer etching of SiO2 by C4F8 physisorption followed by Ar plasma
Sign Up to like & getrecommendations! Published in 2019 at "Applied Physics Letters"
DOI: 10.1063/1.5119033
Abstract: Atomic Layer Etching is performed on SiO2 samples cooled down to a very low temperature (below −100 °C). C4F8 gas flow is injected and molecules physisorb on the cooled surfaces. Etching is then carried out using… read more here.
Keywords: etching sio2; c4f8; microscopy; atomic layer ... See more keywords
Perfluorocyclobutane (PFC-318, c-C4F8) in the global atmosphere
Sign Up to like & getrecommendations! Published in 2019 at "Atmospheric Chemistry and Physics"
DOI: 10.5194/acp-2019-267
Abstract: Abstract. We reconstruct atmospheric abundances of the potent greenhouse gas c-C4F8 (perfluorocyclobutane, perfluorocarbon PFC-318) from measurements of in situ, archived, firn, and aircraft air samples with precisions of ~ 1–2 % reported on the SIO-14 gravimetric calibration… read more here.
Keywords: production; pfc 318; c4f8; product ... See more keywords