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Published in 2020 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2020.138420
Abstract: Abstract For the integration of the thermoelectric and magneto resistive active material (Ca2CoO3)0.62CoO2 (Ca3Co4O9) into silicon technology it is mandatory to provide, apart from diffusion barriers and epitaxial growth, electrical contacts with minimal electrical resistance…
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Keywords:
ca3co4o9;
resistance;
contact;
ca2coo3 62coo2 ... See more keywords