Synthesis of End-Cap Enabled Self-Immolative Photoresists For Extreme Ultraviolet Lithography.
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DOI: 10.1021/acsmacrolett.2c00395
Abstract: Conventional chemically amplified resists (CARs) rely on the usage of photoacid generators to serve as the source of chemical amplification. However, acid diffusion inevitably accompanies CARs and has led to the resolution, line edge roughness,… read more here.
Keywords: lithography; extreme ultraviolet; cap enabled; cap ... See more keywords