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Published in 2021 at "ELECTROPHORESIS"
DOI: 10.1002/elps.202000351
Abstract: Electrochemical techniques are commonly applied to micro total analysis system (μTAS) devices mainly due to its high sensitivity and miniaturization capacity. Among many electrochemical techniques, capacitively coupled contactless conductivity detection (C4D) stands out for not… read more here.
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Published in 2017 at "Nature biomedical engineering"
DOI: 10.1038/s41551-017-0038
Abstract: Advanced capabilities in electrical recording are essential for the treatment of heart-rhythm diseases. The most advanced technologies use flexible integrated electronics; however, the penetration of biological fluids into the underlying electronics and any ensuing electrochemical… read more here.
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Published in 2018 at "Analytical Methods"
DOI: 10.1039/c8ay01635f
Abstract: In this study, a gradient reverse phase high performance liquid chromatography combined with a capacitively coupled contactless conductivity detection (RP-HPLC-C4D) method for simultaneous determination of phospholipid and fatty glyceride in liposome was developed. After saponification,… read more here.
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Published in 2018 at "AIP Advances"
DOI: 10.1063/1.5022654
Abstract: The behavior of a single frequency capacitively coupled plasma (CCP) driven by 13.56 MHz rf source is investigated using an approach that integrates a nonlinear global analytical model and experimental data. The non linear model… read more here.
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Published in 2019 at "Physics of Plasmas"
DOI: 10.1063/1.5079256
Abstract: Capacitively coupled O2-containing Ar plasma driven by a radio frequency (RF) of 27.12 MHz has been investigated. The electron energy probability function (EEPF) was measured with a Langmuir probe. The electronegativity was measured with a laser-induced… read more here.
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Published in 2019 at "Journal of Applied Physics"
DOI: 10.1063/1.5120265
Abstract: Capacitively coupled plasma (CCP) is mainly being used in the semiconductor industry for plasma-enhanced chemical vapor deposition of uniform thin films. Because a discharge volume in the standard configuration of a CCP reactor is surrounded… read more here.
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Published in 2021 at "Physics of Plasmas"
DOI: 10.1063/5.0037685
Abstract: In the paper [Y.C. Kim et al., Phys. Plasmas 22, 123504 (2015)], the plasma density in radio frequency (RF) capacitively coupled plasma was increased by introducing a step-down ferrite-core transformer into a conventional type-T impedance… read more here.
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Published in 2022 at "Journal of Physics D: Applied Physics"
DOI: 10.1088/1361-6463/ac49b6
Abstract: Matching networks are of vital importance for capacitively coupled plasmas (CCPs) to maximize the power transferred to the plasma discharge. The nonlinear interaction between the external circuit and plasma has to be considered to design… read more here.
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Published in 2018 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/aae5c2
Abstract: Optimal voltage waveforms for capacitively coupled plasma discharges are numerically investigated using a particle-in-cell kinetic model. The focus is on nanosecond time scales where the transient plasma response and charge separation in the plasma can… read more here.
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Published in 2021 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/abe728
Abstract: We present a detailed analysis of electron trajectories within the sheath regions of capacitively coupled plasmas excited by radio-frequency voltage waveforms at low pressures. Complex features inside the sheaths are identified in several physical quantities,… read more here.
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Published in 2022 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/ac47e4
Abstract: Radio frequency capacitively coupled plasmas (RF CCPs) sustained in fluorocarbon gases or their mixtures with argon are widely used in plasma-enhanced etching. In this work, we conduct studies on instabilities in a capacitive CF4/Ar (1:9)… read more here.