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Published in 2020 at "Microelectronics Reliability"
DOI: 10.1016/j.microrel.2019.113516
Abstract: Abstract Metal-insulator-metal capacitors were used for determining the DC and frequency-dependent characteristics of ultra-thin Al2O3 (Thox = 22 nm). For this purpose, a state-of-the-art insulating layer was formed using atomic deposition, which enables enhanced performance of devices and…
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Keywords:
simple test;
test vehicles;
frequency;
mim capacitors ... See more keywords