Deposition of High-k Tantalum Oxide by DC Hollow Cathode Gas Flow Sputtering and the Influence of DC and Pulsed DC Substrate Bias
Sign Up to like & getrecommendations! Published in 2025 at "IEEE Journal of the Electron Devices Society"
DOI: 10.1109/jeds.2025.3624015
Abstract: This work investigates the capability of direct current (DC) excited hollow cathode gas flow sputtering (GFS) to contribute to the synthesis of high performing thin films for micro electronic applications. Therefore, high-k tantalum oxide (TaOx)… read more here.
Keywords: cathode gas; hollow cathode; gas flow; substrate bias ... See more keywords
Investigating the Parameter-Driven Cathode Gas Diffusion of PEMFCs with a Piecewise Linearization Model
Sign Up to like & getrecommendations! Published in 2023 at "Energies"
DOI: 10.3390/en16093770
Abstract: Improving mass transfer in gas diffusion layers is critical to achieving high-performance proton-exchange membrane fuel cells (PEMFCs). Leaks through the interface between the gas and the membrane electrode assembly frame have been widely investigated, and… read more here.
Keywords: gas; diffusion; gas diffusion; parameter ... See more keywords