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Published in 2025 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ae14a5
Abstract: Although manufacturing charge-coupled devices (CCDs) on complementary metal–oxide–semiconductor (CMOS) processes enhances device integration and reduces power consumption, it introduces process features like thin oxide layers and nanoscale gate gaps. Specifically, thinned oxides cause gate oxide…
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Keywords:
charge transfer;
cmos;
model;
ccd cmos ... See more keywords
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Published in 2017 at "Journal of Instrumentation"
DOI: 10.1088/1748-0221/12/04/c04010
Abstract: Intrapixel nonuniformity is known to exist in CCD and CMOS image sensors, though the effects in backside illuminated (BSI) CCDs are too small to be a concern for most astronomical observations. However, projects like the…
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Keywords:
effects ccd;
intrapixel effects;
ccd cmos;
cmos detectors ... See more keywords
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Published in 2025 at "IEEE Sensors Journal"
DOI: 10.1109/jsen.2025.3632883
Abstract: A new design of active deep trench chargecoupled device (CCD)-on-CMOS is described and characterized, featuring a two-phase pixel with a built-in electric field that enables highly efficient and fast charge transfer. A charge transfer inefficiency…
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Keywords:
ccd cmos;
active deep;
charge transfer;
transfer ... See more keywords
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Published in 2024 at "IEEE Transactions on Nuclear Science"
DOI: 10.1109/tns.2024.3358381
Abstract: Total ionizing dose (TID) effects are explored in a fully depleted n-type CCD-on-CMOS based on capacitive deep trench isolation (CDTI). The root cause of the observed degradation on full well charge (FWC), charge transfer efficiency…
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Keywords:
ccd cmos;
dose effects;
ionizing dose;
total ionizing ... See more keywords