Effect of Ar:N2 flow rate on morphology, optical and electrical properties of CCTO thin films deposited by RF magnetron sputtering
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DOI: 10.1016/j.ceramint.2019.04.245
Abstract: Abstract Calcium copper titanate (CCTO) thin films were deposited on indium tin oxide (ITO) substrates using radio frequency (RF) magnetron sputtering, at selected Ar:N 2 flow rates (1:1, 1:2, 1:4, and 1:6 sccm) at ambient… read more here.
Keywords: thin films; films deposited; ccto thin; flow rate ... See more keywords