On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O2 + Ar Gas Mixture by CF4/O2 and O2/Ar Mixing Ratios
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DOI: 10.1007/s11090-017-9820-z
Abstract: The effects of both CF4/O2 and Ar/O2 mixing ratios in three-component CF4 + O2 + Ar mixture on plasma parameters, densities and fluxes of active species determining the dry etching kinetics were analyzed. The investigation combined plasma diagnostics by… read more here.
Keywords: plasma; cf4; gas; mixing ratios ... See more keywords