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Published in 2020 at "Advanced Electronic Materials"
DOI: 10.1002/aelm.202000395
Abstract: 2D transition metal dichalcogenides (TMDs) are promising semiconductive films for applications in future devices due to their prosperous and tunable band structures. However, most TMD‐based top gate transistors suffer from a significant doping effect in…
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Keywords:
gate;
channel doping;
field effect;
effect ... See more keywords
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Published in 2017 at "Silicon"
DOI: 10.1007/s12633-017-9631-0
Abstract: The paper reports the analytical model for the analysis of the effects of channel doping on the threshold voltage. A silicon germanium p-MOSFET with high-k dielectric material along with a metal gate is used for…
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Keywords:
mosfet;
threshold voltage;
channel doping;
doping threshold ... See more keywords
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Published in 2017 at "Optik"
DOI: 10.1016/j.ijleo.2017.03.071
Abstract: Abstract In this paper, graded channel doping (GCD) and junctionless paradigms are proposed as a new ways to improve the optical controlled field effect transistor (OCFET) and bridging the gap between the high responsivity and…
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Keywords:
junctionless;
channel doping;
sensitivity;
performance ... See more keywords
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Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.01.003
Abstract: Abstract The influence of variations in the Si fin shape on the electrical properties of junctionless transistors (JLTs) was investigated through two-dimensional Poisson equation numerical simulations at different doping concentrations. Stronger gate coupling in a…
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Keywords:
impact fin;
doping concentrations;
channel doping;
junctionless transistors ... See more keywords