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Published in 2019 at "Beilstein Journal of Nanotechnology"
DOI: 10.3762/bjnano.10.182
Abstract: Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse magnetron sputtering…
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Keywords:
characterization si1;
grown annealed;
fabrication characterization;
si1 xgex ... See more keywords