Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning
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DOI: 10.3390/nano10122443
Abstract: This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding… read more here.
Keywords: line space; self assembly; line; resist free ... See more keywords