Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
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DOI: 10.1186/s13568-017-0504-0
Abstract: A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against… read more here.
Keywords: aspergillus niveus; methodology; tannic acid; chromium tannic ... See more keywords