Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers
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DOI: 10.1016/j.tsf.2019.137534
Abstract: Abstract In this work, we present the morphological and electrical characterization of hydrogenated amorphous siliconfilms, which were deposited at room temperature on a n+-type silicon substrate using the electron cyclotron resonance chemical vapor deposition (ECR-CVD)… read more here.
Keywords: chuck powers; electron cyclotron; room temperature; hydrogenated amorphous ... See more keywords