Study on the Pulse‐Jet Cleaning Process for a Filter Cartridge and Its Optimal Designs on the Induced Nozzle
Sign Up to like & getrecommendations! Published in 2025 at "Asia-Pacific Journal of Chemical Engineering"
DOI: 10.1002/apj.70082
Abstract: Pulse‐jet cleaning technology is commonly used during the cleaning process of cartridge dust collectors. Understanding the changes in the airflow field and the transport laws of dust particles during the pulse‐jet cleaning process is important… read more here.
Keywords: cartridge; jet cleaning; cleaning process; pulse jet ... See more keywords
Towards Integration of Ni-Slag Cleaning Process and Lithium-Ion Battery Recycling for an Efficient Recovery of Valuable Metals
Sign Up to like & getrecommendations! Published in 2024 at "Metallurgical and Materials Transactions B"
DOI: 10.1007/s11663-024-03185-0
Abstract: Spent lithium-ion batteries (SBs) are important sources of valuable and critical raw materials. An integration of battery recycling with well-established primary processes for metals production has many advantages. In this work, the recycling of two… read more here.
Keywords: battery; slag cleaning; slag; cleaning process ... See more keywords
Recent development of photocatalytic nanomaterials in mixed matrix membrane for emerging pollutants and fouling control, membrane cleaning process.
Sign Up to like & getrecommendations! Published in 2021 at "Chemosphere"
DOI: 10.1016/j.chemosphere.2021.130891
Abstract: Membrane-based separation is an area of extensive research in wastewater treatment, which includes the control of pollution and reuse of water. The fabrication and modification membranes for prevention and reduction of pollution to provide quality… read more here.
Keywords: control; process; recent development; membrane ... See more keywords
Study on particle removal during the Co post-CMP cleaning process
Sign Up to like & getrecommendations! Published in 2021 at "Colloids and Surfaces A: Physicochemical and Engineering Aspects"
DOI: 10.1016/j.colsurfa.2021.127189
Abstract: Abstract The cleaning process of a cobalt surface after the chemical mechanical polishing (CMP) process is indispensable for removing a large amount of residue. In this work, the particle removal efficiency of three target solutions… read more here.
Keywords: cleaning process; particle removal; process; microscopy ... See more keywords
The microparticles adhesion and removal dynamics in wafer-scale physical cleaning process
Sign Up to like & getrecommendations! Published in 2025 at "Physics of Fluids"
DOI: 10.1063/5.0252092
Abstract: The wafer-scale physical cleaning process plays a significant role in the semiconductor industry. In this study, the microparticle adhesion and removal dynamics in the wafer-scale physical cleaning are systematically explored. A lattice Boltzmann method is… read more here.
Keywords: removal; cleaning process; physical cleaning; wafer scale ... See more keywords
Optimization of cleaning process parameters to remove abrasive particles in post-Cu CMP cleaning
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Semiconductors"
DOI: 10.1088/1674-4926/39/12/126002
Abstract: The cleaning of copper interconnect chemical mechanical polishing (CMP) is a key process in integrated circuits (ICs) fabrication. Colloidal silica, which is used as the abrasive material in copper CMP slurry, is considered as the… read more here.
Keywords: abrasive particles; cleaning process; optimization cleaning; cmp ... See more keywords
Application of plasma cleaning process in MEMS filter micro-assembly
Sign Up to like & getrecommendations! Published in 2020 at "Modern Physics Letters B"
DOI: 10.1142/s0217984920502565
Abstract: To solve the problems of low efficiency and high void rate in the process of the MEMS filter (die) attach and increase the strength of wire bonding between the die and microwave circuit board, plas... read more here.
Keywords: mems filter; application plasma; plasma cleaning; process mems ... See more keywords
Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor
Sign Up to like & getrecommendations! Published in 2017 at "ECS Journal of Solid State Science and Technology"
DOI: 10.1149/2.0161708jss
Abstract: A quick cleaning process was developed for a silicon carbide chemical vapor deposition reactor. For this purpose, the stability of the susceptor coating film made of pyrolytic carbon was evaluated by means of exposing it… read more here.
Keywords: carbide chemical; silicon carbide; chemical vapor; vapor deposition ... See more keywords
Data Cleaning Process for mHealth Log Data to Inform Health Worker Performance
Sign Up to like & getrecommendations! Published in 2022 at "Studies in health technology and informatics"
DOI: 10.3233/shti220664
Abstract: Log data, captured during use of mobile health (mHealth) applications by health providers, can play an important role in informing nature of user engagement with the application. The log data can also be employed in… read more here.
Keywords: health; mhealth; log; log data ... See more keywords
Remediation Capacity of Different Microalgae in Effluents Derived from the Cigarette Butt Cleaning Process
Sign Up to like & getrecommendations! Published in 2022 at "Plants"
DOI: 10.3390/plants11131770
Abstract: Microalgal-based remediation is an ecofriendly and cost-effective system for wastewater treatment. This study evaluated the capacity of microalgae in the remediation of wastewater from cleaning process of smoked cigarette butts (CB). At laboratory scale, six… read more here.
Keywords: capacity; remediation capacity; remediation; microalgae ... See more keywords