Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
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DOI: 10.1039/c6tc05201k
Abstract: Metal oxo cluster photoresists have drawn a lot of attention in recent years due to their interesting properties combining the advantages of both inorganic and organic features. Their organic functionalities offer the possibility of patterning… read more here.
Keywords: cluster photoresists; zinc oxo; duv lithography; cluster ... See more keywords