Semi-automatic wafer examination procedure for non-destructive control of spray coating processes
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DOI: 10.1007/s00542-017-3322-z
Abstract: During the development of resist materials for lithographic application and their respective coating methods, numerous batches of samples have to be characterized in terms of resist thickness and edge coverage within a short timeframe. In… read more here.
Keywords: examination procedure; spray; spray coating; non destructive ... See more keywords