Controlled cobalt recess for advanced interconnect metallization
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DOI: 10.1016/j.mee.2019.111131
Abstract: Abstract We have developed a wet chemical etch process for the controlled recess of cobalt metal based on ‘digital etching’. Digital etching is a cyclic process wherein each process cycle comprises an oxidation and oxide… read more here.
Keywords: controlled cobalt; advanced interconnect; cobalt; recess ... See more keywords