Multiple Patterning Layout Decomposition Considering Complex Coloring Rules and Density Balancing
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DOI: 10.1109/tcad.2017.2681068
Abstract: Multiple patterning lithography has been recognized as one of the most promising solutions, in addition to extreme ultraviolet lithography, directed self-assembly, nanoimprint lithography, and electron beam lithography, for advancing the resolution limit of conventional optical… read more here.
Keywords: multiple patterning; complex coloring; coloring rules; layout decomposition ... See more keywords