Investigation of an atomic‐layer‐deposited Al2O3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
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DOI: 10.1002/sia.6955
Abstract: In order to enable the application of atomic probe tomography combinatorial processing platforms for atomic‐scale investigations of phase evolution at elevated temperatures, the pre‐sharpened Si tip of 10–20 nm in diameter must be protected against interdiffusion… read more here.
Keywords: atomic layer; diffusion; layer; atomic scale ... See more keywords