Consecutive imprinting performance of large area UV nanoimprint lithography using Bi-layer soft stamps in ambient atmosphere
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DOI: 10.1016/j.mee.2017.01.032
Abstract: For UV nanoimprint lithography (UV-NIL) using polymer soft stamps, imprinting at ambient atmosphere brings additional challenges due to evaporated solvents and possible byproducts resulting from the interaction between the UV light, oxygen and the polymer-based… read more here.
Keywords: pdms pdms; using layer; ambient atmosphere; consecutive imprints ... See more keywords