Simple method for the identification of electrical and thermal contact resistances in spark plasma sintering
Sign Up to like & getrecommendations! Published in 2021 at "Journal of The European Ceramic Society"
DOI: 10.1016/j.jeurceramsoc.2020.08.073
Abstract: Abstract The electrical and thermal contact resistances are key parameters for obtaining an accurate electro-thermal model of the spark plasma sintering (SPS) process. However, due to the lack of a general expression, these parameters are… read more here.
Keywords: thermal contact; electrical thermal; plasma sintering; contact resistances ... See more keywords
Coating effects on contact conditions in resistance spot weldability
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Materials Processing Technology"
DOI: 10.1016/j.jmatprotec.2017.11.009
Abstract: Abstract An experimental apparatus was designed to reproduce a resistance spot welding operation and allow observation via infrared camera. A specific ex situ device was used to measure the variations of electrical contact resistances, versus… read more here.
Keywords: coating effects; sheet; resistance spot; contact resistances ... See more keywords
Enhanced thermoelectric figure of merit of individual Si nanowires with ultralow contact resistances
Sign Up to like & getrecommendations! Published in 2020 at "Nano Energy"
DOI: 10.1016/j.nanoen.2019.104191
Abstract: Abstract Low-dimensional silicon-based materials have shown a great potential for thermoelectric applications due to their enhanced figure of merit ZT and high technology compatibility. However, their implementation in real devices remains highly challenging due to… read more here.
Keywords: contact; figure merit; ultralow contact; contact resistances ... See more keywords
Lowering Contact Resistances of Two-Dimensional Semiconductors by Memristive Forming.
Sign Up to like & getrecommendations! Published in 2022 at "Nano letters"
DOI: 10.1021/acs.nanolett.2c02136
Abstract: Two-dimensional semiconductors have great potential for beyond-silicon electronics. However, because of the lack of controllable doping methods, Fermi level pinning, and van der Waals (vdW) gaps at the metal-semiconductor interfaces, these devices exhibit high electrical… read more here.
Keywords: lowering contact; two dimensional; dimensional semiconductors; memristive forming ... See more keywords
Optimization of Ohmic Contacts to n -Type Ga As Nanowires
Sign Up to like & getrecommendations! Published in 2018 at "Physical review applied"
DOI: 10.1103/physrevapplied.10.034024
Abstract: Group III-group V nanowires are comprehensively studied because of their suitability for optoelectronic quantum technology applications. However, their small dimensions and the spatial separation of carriers from the wire surface render electrical contacting difficult. Systematically… read more here.
Keywords: ohmic contacts; contact resistances; type nanowires; contacts type ... See more keywords