Ga-doped ZnO films magnetron sputtered at ultralow discharge voltages: Significance of controlling defect generation
Sign Up to like & getrecommendations! Published in 2018 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2018.03.019
Abstract: Abstract In magnetron sputtered oxide thin films, both the structure and physical properties are affected by bombardment-induced defects and their annihilation. Ga-doped zinc oxide (GZO) films with low Ga content (~1.7 at.%) were magnetron sputtered at… read more here.
Keywords: magnetron sputtered; controlling defect; defect generation; discharge voltages ... See more keywords