Controlling the Geometries of Si Nanowires through Tunable Nanosphere Lithography.
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DOI: 10.1021/acsami.6b09959
Abstract: A tunable nanosphere lithography (NSL) technique is combined with metal-assisted etching of silicon (Si) to fabricate ordered, high-aspect-ratio Si nanowires. Non-close-packed structures are directly prepared via shear-induced ordering of the nanospheres. The spacing between the… read more here.
Keywords: nanowires tunable; controlling geometries; nanosphere lithography; tunable nanosphere ... See more keywords