Quantitative Evaluation of Cobalt Disilicide/Si Interfacial Roughness
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DOI: 10.1149/2.0271705jss
Abstract: The formation of smooth, conformal cobalt disilicide (CoSi2) without facets or voids is critical for microelectronic device reliability owing to the ultra-shallow contact areas. Here we demonstrate the formation of smooth and conformal CoSi2 films… read more here.
Keywords: interfacial roughness; cobalt; cosi2; quantitative evaluation ... See more keywords