Power matching to pulsed inductively coupled plasmas
Sign Up to like & getrecommendations! Published in 2020 at "Journal of Applied Physics"
DOI: 10.1063/5.0002522
Abstract: Matching of power delivery to nonlinear loads in plasma processing is a continuing challenge. Plasma reactors used in microelectronics fabrication are increasingly multi-frequency and/or pulsed, producing a non-linear and, in many cases, non-steady state electrical… read more here.
Keywords: plasma; coupled plasmas; power; pulsed inductively ... See more keywords
E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions
Sign Up to like & getrecommendations! Published in 2023 at "Journal of Applied Physics"
DOI: 10.1063/5.0146168
Abstract: Electronegative inductively coupled plasmas (ICPs) are used for conductor etching in the microelectronics industry for semiconductor fabrication. Pulsing of the antenna power and bias voltages provides additional control for optimizing plasma–surface interactions. However, pulsed ICPs… read more here.
Keywords: coupled plasmas; antenna; antenna geometry; geometry ... See more keywords
Intrasheath electron dynamics in low pressure capacitively coupled plasmas
Sign Up to like & getrecommendations! Published in 2021 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/abe728
Abstract: We present a detailed analysis of electron trajectories within the sheath regions of capacitively coupled plasmas excited by radio-frequency voltage waveforms at low pressures. Complex features inside the sheaths are identified in several physical quantities,… read more here.
Keywords: electron dynamics; coupled plasmas; capacitively coupled; intrasheath electron ... See more keywords
Benchmarking and validation of a hybrid model for electropositive and electronegative capacitively coupled plasmas
Sign Up to like & getrecommendations! Published in 2023 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/acce63
Abstract: In this work, a fluid/Monte Carlo collision (fluid/MCC) hybrid model is developed based on the framework of multi-physics analysis of plasma sources. This hybrid model could be highly accurate in predicting the nonequilibrium phenomena in… read more here.
Keywords: coupled plasmas; capacitively coupled; mcc; hybrid model ... See more keywords
Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code
Sign Up to like & getrecommendations! Published in 2022 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/accecb
Abstract: Phenomena taking place in capacitively coupled plasmas with large electrodes and driven at very high frequencies are studied numerically utilizing a novel energy- and charge-conserving implicit fully electromagnetic particle-in-cell (PIC)/Monte Carlo code ECCOPIC2M. The code… read more here.
Keywords: coupled plasmas; capacitively coupled; particle cell; fully electromagnetic ... See more keywords
Analysis of perovskite oxide etching using argon inductively coupled plasmas for photonics applications
Sign Up to like & getrecommendations! Published in 2021 at "Nanoscale Research Letters"
DOI: 10.1186/s11671-021-03494-2
Abstract: We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN).… read more here.
Keywords: using argon; coupled plasmas; spectroscopy; photonics applications ... See more keywords