CrSb2Te thin film as a dry resist and its etching mechanism for lithography application
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DOI: 10.1016/j.matchemphys.2021.124558
Abstract: Abstract Lithography has important applications in chip manufacturing, micro-electro-mechanical system, nanostructure fabrication, et al. Photoresist is a key factor for the lithography. However, current organic resists suffer from poor line-edge roughness, environmentally unfriendly, et al.… read more here.
Keywords: crsb2te thin; thin film; lithography; film ... See more keywords