P-type single-crystalline ZnO films obtained by (Li, N) dual implantation through dynamic annealing process
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DOI: 10.1007/s10854-017-7523-0
Abstract: Single-crystalline ZnO films were grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy technique. The films have been implanted with fixed fluence of 30 keV Li and 80 keV N ions at 460 °C. It is shown… read more here.
Keywords: zno films; single crystalline; crystalline zno; implantation ... See more keywords