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Published in 2020 at "Nano Energy"
DOI: 10.1016/j.nanoen.2020.104733
Abstract: Abstract Pyroelectric coefficients are measured for Si, Sr, La, Al, and Gd doped HfO2 thin films as well as the solid-solution Hf0.5Zr0.5O2 composition from 280 to 440 K. Pyroelectric currents show sensitivity to the dopant used…
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Keywords:
hfo2 thin;
thin films;
ferroelectric hfo2;
curie constant ... See more keywords