Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers
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DOI: 10.1021/acs.macromol.9b01181
Abstract: Solvent vapor annealing (SVA) is known to be a simple, low-cost, and highly efficient technique to produce defect-free diblock copolymer (BCP) thin films. Not only can the solvent weaken the BCP se... read more here.
Keywords: thin films; diblock; defect removal; vapor annealing ... See more keywords