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Published in 2023 at "Materials"
DOI: 10.3390/ma16093471
Abstract: Defect control of extreme ultraviolet (EUV) masks using pellicles is challenging for mass production in EUV lithography because EUV pellicles require more critical fabrication than argon fluoride (ArF) pellicles. One of the fabrication requirements is…
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Keywords:
transverse deflection;
euv;
extreme ultraviolet;
deflection extreme ... See more keywords