Transverse Deflection for Extreme Ultraviolet Pellicles
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DOI: 10.3390/ma16093471
Abstract: Defect control of extreme ultraviolet (EUV) masks using pellicles is challenging for mass production in EUV lithography because EUV pellicles require more critical fabrication than argon fluoride (ArF) pellicles. One of the fabrication requirements is… read more here.
Keywords: transverse deflection; euv; extreme ultraviolet; deflection extreme ... See more keywords